DSpace at KISTKIST Patent2009

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dc.contributor.author윤석진-
dc.contributor.author송현철-
dc.contributor.author김진상-
dc.contributor.author강종윤-
dc.contributor.author최지원-
dc.date.accessioned2024-01-12T15:03:55Z-
dc.date.available2024-01-12T15:03:55Z-
dc.date.issued2011-08-22-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/89854-
dc.title고밀도의 압전 후막의 제조방법-
dc.typePatent-
dc.date.registration2011-08-22-
dc.date.application2009-09-03-
dc.identifier.patentRegistrationNumber1059750-
dc.identifier.patentApplicationNumber2009-0083182-
dc.publisher.countryKO-
dc.type.iprs특허-
dc.contributor.assignee한국과학기술연구원-
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KIST Patent > 2009
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