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dc.contributor.authorFelisita Annisanti Masud-
dc.contributor.authorCho Hyun Jin-
dc.contributor.authorMyung Jong Kim-
dc.date.accessioned2024-01-12T16:06:44Z-
dc.date.available2024-01-12T16:06:44Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/91254-
dc.languageEnglish-
dc.subjectCVD-
dc.subjectgraphene-
dc.subjectphysical properties-
dc.titleInfluence of Electrochemical Polishing and High-Pressure Annealing on Physical Properties of Chemical Vapor Deposition Graphene-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation한국탄소학회-
dc.citation.title한국탄소학회-
dc.citation.conferencePlaceKO-
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