DSpace at KISTKIST Conference PaperOthers

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dc.contributor.authorKim A Young-
dc.contributor.authorChairul Hudaya-
dc.contributor.authorPark Ji Hun-
dc.contributor.authorCHOI, WONCHANG-
dc.contributor.author변동진-
dc.contributor.authorLee, Joong Kee-
dc.date.accessioned2024-01-12T20:04:59Z-
dc.date.available2024-01-12T20:04:59Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/95574-
dc.languageEnglish-
dc.subjectECR-MOCVD-
dc.subjectElctrochromic device-
dc.subjectFTO and Plasma treatment-
dc.subjectECDs-
dc.titleElectrochemical characteristics of plasma treated materials for a high response rate as transparent electrochromic devices-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationIUMRS-ICA 2012-
dc.citation.titleIUMRS-ICA 2012-
dc.citation.conferencePlaceKO-
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