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dc.contributor.authorPark, Min-Chul-
dc.contributor.authorJhon, Young Min-
dc.contributor.authorKim, Yong Tae-
dc.date.accessioned2024-01-12T20:06:00Z-
dc.date.available2024-01-12T20:06:00Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/95654-
dc.languageEnglish-
dc.subjectImage-
dc.subjectCompensation-
dc.subjectMask-
dc.subjectMisalignment-
dc.subjectAerial-
dc.subjectImage-
dc.titleImage Compensation of Mask Misalignment in Aerial Image Microscope System-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationINTERNATIONAL CONFERENCE ON ELECTRON, ION, AND PHOTON BEAM TECHNOLOGY AND NANOFABRICATION-
dc.citation.titleINTERNATIONAL CONFERENCE ON ELECTRON, ION, AND PHOTON BEAM TECHNOLOGY AND NANOFABRICATION-
dc.citation.conferencePlaceUS-
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