Full metadata record
| DC Field | Value | Language | 
|---|---|---|
| dc.contributor.author | Park, Min-Chul | - | 
| dc.contributor.author | Jhon, Young Min | - | 
| dc.contributor.author | Kim, Yong Tae | - | 
| dc.date.accessioned | 2024-01-12T20:06:00Z | - | 
| dc.date.available | 2024-01-12T20:06:00Z | - | 
| dc.date.created | 2021-09-29 | - | 
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/95654 | - | 
| dc.language | English | - | 
| dc.subject | Image | - | 
| dc.subject | Compensation | - | 
| dc.subject | Mask | - | 
| dc.subject | Misalignment | - | 
| dc.subject | Aerial | - | 
| dc.subject | Image | - | 
| dc.title | Image Compensation of Mask Misalignment in Aerial Image Microscope System | - | 
| dc.type | Conference | - | 
| dc.description.journalClass | 1 | - | 
| dc.identifier.bibliographicCitation | INTERNATIONAL CONFERENCE ON ELECTRON, ION, AND PHOTON BEAM TECHNOLOGY AND NANOFABRICATION | - | 
| dc.citation.title | INTERNATIONAL CONFERENCE ON ELECTRON, ION, AND PHOTON BEAM TECHNOLOGY AND NANOFABRICATION | - | 
| dc.citation.conferencePlace | US | - | 
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