DSpace at KISTKIST Patent2018

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dc.contributor.author최원창-
dc.contributor.author권용욱-
dc.contributor.author김상옥-
dc.contributor.author정훈기-
dc.contributor.author김형석-
dc.contributor.author임희대-
dc.contributor.author이용호-
dc.contributor.author오시형-
dc.contributor.author김형우-
dc.contributor.author임효준-
dc.contributor.author김도원-
dc.contributor.author장지혜-
dc.contributor.author정경윤-
dc.date.accessioned2024-01-12T22:01:39Z-
dc.date.available2024-01-12T22:01:39Z-
dc.date.issued2020-09-15-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/97612-
dc.title계면활성제를 활용하여 이차전지 소재 표면에 전도성 고분자 코팅층을 균일하게 형성하는 제조 방법-
dc.typePatent-
dc.date.registration2020-09-15-
dc.date.application2018-07-31-
dc.identifier.patentRegistrationNumber10-2158221-
dc.identifier.patentApplicationNumber10-2018-0089183-
dc.publisher.countryKO-
dc.type.iprs특허-
dc.contributor.assignee한국과학기술연구원-
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KIST Patent > 2018
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