DSpace at KISTKIST Patent2008

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dc.contributor.author이승철-
dc.contributor.author안효신-
dc.contributor.author이광렬-
dc.date.accessioned2024-01-12T23:31:15Z-
dc.date.available2024-01-12T23:31:15Z-
dc.date.issued2009-02-12-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/99279-
dc.title전도성 질화물을 사이층으로 사용한 높은 스핀주입 효율을 갖는 다층막 구조 및 그 제조방법-
dc.typePatent-
dc.date.registration2009-02-12-
dc.date.application2008-07-18-
dc.identifier.patentRegistrationNumber0884610-
dc.identifier.patentApplicationNumber2008-0070334-
dc.publisher.countryKO-
dc.type.iprs특허-
dc.contributor.assignee한국과학기술연구원-
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KIST Patent > 2008
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