Full metadata record

DC Field Value Language
dc.contributor.author이연희-
dc.contributor.author한승희-
dc.date.accessioned2024-01-13T00:02:02Z-
dc.date.available2024-01-13T00:02:02Z-
dc.date.issued1999-06-04-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/99901-
dc.title플라즈마 이온 주입에 의한 고분자 소재의 표면개질 방법 및 그 장치-
dc.typePatent-
dc.date.registration1999-06-04-
dc.date.application1996-04-10-
dc.identifier.patentRegistrationNumber0217538-
dc.identifier.patentApplicationNumber1996-0010740-
dc.publisher.countryKO-
dc.type.iprs특허-
dc.contributor.assignee한국과학기술연구원-
Appears in Collections:
KIST Patent > Others
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE