Showing results 3 to 6 of 6
Issue Date | Title | Author(s) |
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2024-04 | High-Temperature Atomic Layer Deposition of Rutile TiO2 Films on RuO2 Substrates: Interfacial Reactions and Dielectric Performance | Jeon, Jihoon; Kim, Taikyu; Jang, Myoungsu; Chung, Hong Keun; Kim, Sung-Chul; Won, Sung Ok; Park, Yongjoo; Choi, Byung Joon; Chung, Yoon Jang; Kim, Seong Keun |
2020-01 | Investigation of phases and chemical states of tin titanate films grown by atomic layer deposition | Chung, Hong Keun; Pyeon, Jung Joon; Baek, In-Hwan; Lee, Ga-Yeon; Lee, Hansol; Won, Sung Ok; Han, Jeong Hwan; Chung, Taek-Mo; Park, Tae Joo; Kim, Seong Keun |
2023-07 | Nucleation and Layer Closure Behavior of Iridium Films Grown Using Atomic Layer Deposition | Chung, Hong Keun; Kim, Han; Jeon, Jihoon; Kim, Sung-Chul; Won, Sung Ok; Harada, Ryosuke; Tsugawa, Tomohiro; Chung, Yoon Jang; Baek, Seung-Hyub; Park, Tae Joo; Kim, Seong Keun |
2024-02 | Phase-controlled molybdenum dioxide electrodes by RF reactive magnetron sputtering for achieving high-k rutile TiO2 dielectric | Lee, Jae Hyeon; Kang, Wangu; Chung, Hong Keun; Kim, Seong Keun; Han, Jeong Hwan |