Showing results 4 to 4 of 4
Issue Date | Title | Author(s) |
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2024-04 | High-Temperature Atomic Layer Deposition of Rutile TiO2 Films on RuO2 Substrates: Interfacial Reactions and Dielectric Performance | Jeon, Jihoon; Kim, Taikyu; Jang, Myoungsu; Chung, Hong Keun; Kim, Sung-Chul; Won, Sung Ok; Park, Yongjoo; Choi, Byung Joon; Chung, Yoon Jang; Kim, Seong Keun |