Showing results 1 to 13 of 13
Issue Date | Title | Author(s) |
---|---|---|
2018-11-09 | A Ru-Pt alloy electrode to suppress leakage currents of dynamic random-access memory capacitors | Pyeon, Jung Joon; Cho, Cheol Jin; Jeong, Doo Seok; Kim, Jin-Sang; Kang, Chong-Yun; Kim, Seong Keun |
2015-07 | Asymmetry in electrical properties of Al-doped TiO2 film with respect to bias voltage | Jeon, Woojin; Rha, Sang Ho; Lee, Woongkyu; An, Cheol Hyun; Chung, Min Jung; Kim, Sang Hyun; Cho, Cheol Jin; Kim, Seong Keun; Hwang, Cheol Seong |
2019-12-15 | Atomic layer deposition of Ta-doped SnO2 films with enhanced dopant distribution for thermally stable capacitor electrode applications | Cho, Cheol Jin; Pyeon, Jung Joon; Hwang, Cheol Seong; Kim, Jin-Sang; Kim, Seong Keun |
2015-07-31 | Control of the initial growth in atomic layer deposition of Pt films by surface pretreatment | Pyeon, Jung Joon; Cho, Cheol Jin; Baek, Seung-Hyub; Kang, Chong-Yun; Kim, Jin-Sang; Jeong, Doo Seok; Kim, Seong Keun |
2016-11 | Correct Extraction of Frequency Dispersion in Accumulation Capacitance in InGaAs Metal-Insulator-Semiconductor Devices | Lee, Woo Chul; Cho, Cheol Jin; Choi, Jung-Hae; Song, Jin Dong; Hwang, Cheol Seong; Kim, Seong Keun |
2018-08 | Engineering of AlON interlayer in Al2O3/AlON/In0.53Ga0.47As gate stacks by thermal atomic layer deposition | Lee, Woo Chul; Cho, Cheol Jin; Park, Suk-In; Jun, Dong-Hwan; Song, Jin Dong; Hwang, Cheol Seong; Kim, Seong Keun |
2014-11-25 | Enhancement of Initial Growth of ZnO Films on Layer-Structured Bi2Te3 by Atomic Layer Deposition | Kim, Kwang-Chon; Cho, Cheol Jin; Lee, Joohwi; Kim, Hyun Jae; Jeong, Doo Seok; Baek, Seung-Hyub; Kim, Jin-Sang; Kim, Seong Keun |
2014-12-20 | Evaluating the Top Electrode Material for Achieving an Equivalent Oxide Thickness Smaller than 0.4 nm from an Al-Doped TiO2 Film | Jeon, Woojin; Yoo, Sijung; Kim, Hyo Kyeom; Lee, Woongkyu; An, Cheol Hyun; Chung, Min Jung; Cho, Cheol Jin; Kim, Seong Keun; Hwang, Cheol Seong |
2017-08-17 | Growth and Characterization of BeO Thin Films Grown by Atomic Layer Deposition Using H2O and O-3 as Oxygen Sources | Lee, Woo Chul; Cho, Cheol Jin; Kim, Sangtae; Larsen, Eric S.; Yum, Jung Hwan; Bielawski, Christopher W.; Hwang, Cheol Seong; Kim, Seong Keun |
2017-03-14 | Interface Engineering for Extremely Large Grains in Explosively Crystallized TiO2 Films Grown by Low-Temperature Atomic Layer Deposition | Cho, Cheol Jin; Kang, Jun-Yun; Lee, Woo Chul; Baek, Seung-Hyub; Kim, Jin-Sang; Hwang, Cheol Seong; Kim, Seong Keun |
2018-12-28 | MoO2 as a thermally stable oxide electrode for dynamic random-access memory capacitors | Lee, Woongkyu; Cho, Cheol Jin; Lee, Woo Chul; Hwang, Cheol Seong; Chang, Robert P. H.; Kim, Seong Keun |
2014-11-30 | SnO2 thin films grown by atomic layer deposition using a novel Sn precursor | Choi, Min-Jung; Cho, Cheol Jin; Kim, Kwang-Chon; Pyeon, Jung Joon; Park, Hyung-Ho; Kim, Hyo-Suk; Han, Jeong Hwan; Kim, Chang Gyoun; Chung, Taek-Mo; Park, Tae Joo; Kwon, Beomjin; Jeong, Doo Seok; Baek, Seung-Hyub; Kang, Chong-Yun; Kim, Jin-Sang; Kim, Seong Keun |
2017-09-28 | Ta-Doped SnO2 as a reduction-resistant oxide electrode for DRAM capacitors | Cho, Cheol Jin; Noh, Myoung-Sub; Lee, Woo Chul; An, Cheol Hyun; Kang, Chong-Yun; Hwang, Cheol Seong; Kim, Seong Keun |