Browsing byAuthorCho, Cheol Jin

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Showing results 1 to 13 of 13

Issue DateTitleAuthor(s)
2018-11-09A Ru-Pt alloy electrode to suppress leakage currents of dynamic random-access memory capacitorsPyeon, Jung Joon; Cho, Cheol Jin; Jeong, Doo Seok; Kim, Jin-Sang; Kang, Chong-Yun; Kim, Seong Keun
2015-07Asymmetry in electrical properties of Al-doped TiO2 film with respect to bias voltageJeon, Woojin; Rha, Sang Ho; Lee, Woongkyu; An, Cheol Hyun; Chung, Min Jung; Kim, Sang Hyun; Cho, Cheol Jin; Kim, Seong Keun; Hwang, Cheol Seong
2019-12-15Atomic layer deposition of Ta-doped SnO2 films with enhanced dopant distribution for thermally stable capacitor electrode applicationsCho, Cheol Jin; Pyeon, Jung Joon; Hwang, Cheol Seong; Kim, Jin-Sang; Kim, Seong Keun
2015-07-31Control of the initial growth in atomic layer deposition of Pt films by surface pretreatmentPyeon, Jung Joon; Cho, Cheol Jin; Baek, Seung-Hyub; Kang, Chong-Yun; Kim, Jin-Sang; Jeong, Doo Seok; Kim, Seong Keun
2016-11Correct Extraction of Frequency Dispersion in Accumulation Capacitance in InGaAs Metal-Insulator-Semiconductor DevicesLee, Woo Chul; Cho, Cheol Jin; Choi, Jung-Hae; Song, Jin Dong; Hwang, Cheol Seong; Kim, Seong Keun
2018-08Engineering of AlON interlayer in Al2O3/AlON/In0.53Ga0.47As gate stacks by thermal atomic layer depositionLee, Woo Chul; Cho, Cheol Jin; Park, Suk-In; Jun, Dong-Hwan; Song, Jin Dong; Hwang, Cheol Seong; Kim, Seong Keun
2014-11-25Enhancement of Initial Growth of ZnO Films on Layer-Structured Bi2Te3 by Atomic Layer DepositionKim, Kwang-Chon; Cho, Cheol Jin; Lee, Joohwi; Kim, Hyun Jae; Jeong, Doo Seok; Baek, Seung-Hyub; Kim, Jin-Sang; Kim, Seong Keun
2014-12-20Evaluating the Top Electrode Material for Achieving an Equivalent Oxide Thickness Smaller than 0.4 nm from an Al-Doped TiO2 FilmJeon, Woojin; Yoo, Sijung; Kim, Hyo Kyeom; Lee, Woongkyu; An, Cheol Hyun; Chung, Min Jung; Cho, Cheol Jin; Kim, Seong Keun; Hwang, Cheol Seong
2017-08-17Growth and Characterization of BeO Thin Films Grown by Atomic Layer Deposition Using H2O and O-3 as Oxygen SourcesLee, Woo Chul; Cho, Cheol Jin; Kim, Sangtae; Larsen, Eric S.; Yum, Jung Hwan; Bielawski, Christopher W.; Hwang, Cheol Seong; Kim, Seong Keun
2017-03-14Interface Engineering for Extremely Large Grains in Explosively Crystallized TiO2 Films Grown by Low-Temperature Atomic Layer DepositionCho, Cheol Jin; Kang, Jun-Yun; Lee, Woo Chul; Baek, Seung-Hyub; Kim, Jin-Sang; Hwang, Cheol Seong; Kim, Seong Keun
2018-12-28MoO2 as a thermally stable oxide electrode for dynamic random-access memory capacitorsLee, Woongkyu; Cho, Cheol Jin; Lee, Woo Chul; Hwang, Cheol Seong; Chang, Robert P. H.; Kim, Seong Keun
2014-11-30SnO2 thin films grown by atomic layer deposition using a novel Sn precursorChoi, Min-Jung; Cho, Cheol Jin; Kim, Kwang-Chon; Pyeon, Jung Joon; Park, Hyung-Ho; Kim, Hyo-Suk; Han, Jeong Hwan; Kim, Chang Gyoun; Chung, Taek-Mo; Park, Tae Joo; Kwon, Beomjin; Jeong, Doo Seok; Baek, Seung-Hyub; Kang, Chong-Yun; Kim, Jin-Sang; Kim, Seong Keun
2017-09-28Ta-Doped SnO2 as a reduction-resistant oxide electrode for DRAM capacitorsCho, Cheol Jin; Noh, Myoung-Sub; Lee, Woo Chul; An, Cheol Hyun; Kang, Chong-Yun; Hwang, Cheol Seong; Kim, Seong Keun

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