2004-07-22 | A single component photoimaging system with styrene copolymers having t-BOC-protected quinizarin dye precursors and photoacid generating groups in a single polymer chain | Yoo, JH; Kim, SY; Cho, I; Kim, JM; Ahn, KD; Lee, JH |
2000-03 | Crystalline morphology and melting behavior of 100% syndiotactic polystyrene and 70/30 blend of syndiotactic polystyrene and poly(2,6-dimethyl-1,4-phenylenoxide) | Hong, SM; Choi, SH; Lee, CH; Hwang, SS; Kim, KU; Cho, I |
2000-09 | Development of a new sheet deposition type rapid prototyping system | Cho, I; Lee, K; Choi, W; Song, YA |
2001-07-05 | Norbornene-derived quinizarin dye molecules for photoimaging in polymer film based on chemical amplification | Lee, JH; Cho, I; Ahn, KD; Kim, JM |
2001-02 | Novel multi-alicyclic polymers for enhancing plasma etch resistance in 193 nm lithography | Lee, JH; Ahn, KD; Cho, I |
1997-11 | Synthesis and characteristics of thromboresistant copolymers having PEG/PEG-SO3 | Lee, HJ; Park, KD; Han, DK; Kim, YH; Cho, I |
1999-01 | Toughening of syndiotactic polystyrene and poly(2,6-dimethyl-1,4-diphenylene oxide) blends I. Influence of mixing protocol and blend conditions | Choi, SH; Cho, I; Kim, KU |