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Showing results 1 to 3 of 3

Issue DateTitleAuthor(s)
1997-06High resolution single-component resists based on terpolymers having photoacid-generating camphorsulfonyloxymaleimide unitsKim, S.-T.; Kim, J.-B.; Kim, J.-M.; Chung, C.-M.; Ahn, K.-D.
1995-01New resists based on N-protected polymaleimides having hydroxystyrene unitsChung, C.-M.; Kim, S.-T.; Ahn, K.-D.
1996-01Photochemical acid generation and resist application of camphorsulfonyloxymaleimide copolymersChung, C.-M.; Ahn, K.-D.
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