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Photochemical acid generation and resist application of camphorsulfonyloxymaleimide copolymers

Authors: Chung, C.-M.; Ahn, K.-D.

Issue Date: 1996-01

Publisher: Tokai University

Citation: Journal of Photopolymer Science and Technology, v.9, no.4, pp.553 - 556

Abstract: [No abstract available]

ISSN: 0914-9244

URI: https://pubs.kist.re.kr/handle/201004/144868

DOI: 10.2494/photopolymer.9.553

Appears in Collections:: KIST Article > Others

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