Showing results 1 to 9 of 9
Issue Date | Title | Author(s) |
---|---|---|
2023-02 | Area-Selective Atomic Layer Deposition of SnS2 Nanosheets for Applications of Back-End-of-Line-Compatible Transistors | Yim, Jaegyun; Chung, Hong Keun; Ryu, Seung Ho; Kim, Han; Won, Sung Ok; Eom, Taeyong; Chung, Taek-Mo; Kim, Seong Keun |
2024-07 | Atomic Layer Growth of Rutile TiO2 Films with Ultrahigh Dielectric Constants via Crystal Orientation Engineering | Kim, Taikyu; Jeon, Jihoon; Ryu, Seung Ho; Chung, Hong Keun; Jang, Myoungsu; Lee, Seunghyeok; Chung, Yoon Jang; Kim, Seong Keun |
2021-06-01 | Atomic-layer deposition of TiO2 thin films with a thermally stable (CpMe5) Ti(OMe)(3) precursor | Chung, Hong Keun; Won, Sung Ok; Park, Yongjoo; Kim, Jin-Sang; Park, Tae Joo; Kim, Seong Keun |
2024-04 | High-Temperature Atomic Layer Deposition of Rutile TiO2 Films on RuO2 Substrates: Interfacial Reactions and Dielectric Performance | Jeon, Jihoon; Kim, Taikyu; Jang, Myoungsu; Chung, Hong Keun; Kim, Sung-Chul; Won, Sung Ok; Park, Yongjoo; Choi, Byung Joon; Chung, Yoon Jang; Kim, Seong Keun |
2020-01 | Investigation of phases and chemical states of tin titanate films grown by atomic layer deposition | Chung, Hong Keun; Pyeon, Jung Joon; Baek, In-Hwan; Lee, Ga-Yeon; Lee, Hansol; Won, Sung Ok; Han, Jeong Hwan; Chung, Taek-Mo; Park, Tae Joo; Kim, Seong Keun |
2024-08 | Low temperature crystallization of atomic-layer-deposited SrTiO3 films with an extremely low equivalent oxide thickness of sub-0.4 nm | Chung, Hong Keun; Jeon, Jihoon; Kim, Han; Jang, Myoungsu; Kim, Sung-Chul; Won, Sung Ok; Baek, In-Hwan; Chung, Yoon Jang; Han, Jeong Hwan; Cho, Sung Haeng; Park, Tae Joo; Kim, Seong Keun |
2023-07 | Nucleation and Layer Closure Behavior of Iridium Films Grown Using Atomic Layer Deposition | Chung, Hong Keun; Kim, Han; Jeon, Jihoon; Kim, Sung-Chul; Won, Sung Ok; Harada, Ryosuke; Tsugawa, Tomohiro; Chung, Yoon Jang; Baek, Seung-Hyub; Park, Tae Joo; Kim, Seong Keun |
2024-02 | Phase-controlled molybdenum dioxide electrodes by RF reactive magnetron sputtering for achieving high-k rutile TiO2 dielectric | Lee, Jae Hyeon; Kang, Wangu; Chung, Hong Keun; Kim, Seong Keun; Han, Jeong Hwan |
2024-07 | Sustained Area-Selectivity in Atomic Layer Deposition of Ir Films: Utilization of Dual Effects of O3 in Deposition and Etching | Kim, Han; Kim, Taeseok; Chung, Hong Keun; Jeon, Jihoon; Kim, Sung-Chul; Won, Sung Ok; Harada, Ryosuke; Tsugawa, Tomohiro; Kim, Sangtae; Kim, Seong Keun |