Browsing byAuthorChung, Hong Keun

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Showing results 1 to 9 of 9

Issue DateTitleAuthor(s)
2023-02Area-Selective Atomic Layer Deposition of SnS2 Nanosheets for Applications of Back-End-of-Line-Compatible TransistorsYim, Jaegyun; Chung, Hong Keun; Ryu, Seung Ho; Kim, Han; Won, Sung Ok; Eom, Taeyong; Chung, Taek-Mo; Kim, Seong Keun
2024-07Atomic Layer Growth of Rutile TiO2 Films with Ultrahigh Dielectric Constants via Crystal Orientation EngineeringKim, Taikyu; Jeon, Jihoon; Ryu, Seung Ho; Chung, Hong Keun; Jang, Myoungsu; Lee, Seunghyeok; Chung, Yoon Jang; Kim, Seong Keun
2021-06-01Atomic-layer deposition of TiO2 thin films with a thermally stable (CpMe5) Ti(OMe)(3) precursorChung, Hong Keun; Won, Sung Ok; Park, Yongjoo; Kim, Jin-Sang; Park, Tae Joo; Kim, Seong Keun
2024-04High-Temperature Atomic Layer Deposition of Rutile TiO2 Films on RuO2 Substrates: Interfacial Reactions and Dielectric PerformanceJeon, Jihoon; Kim, Taikyu; Jang, Myoungsu; Chung, Hong Keun; Kim, Sung-Chul; Won, Sung Ok; Park, Yongjoo; Choi, Byung Joon; Chung, Yoon Jang; Kim, Seong Keun
2020-01Investigation of phases and chemical states of tin titanate films grown by atomic layer depositionChung, Hong Keun; Pyeon, Jung Joon; Baek, In-Hwan; Lee, Ga-Yeon; Lee, Hansol; Won, Sung Ok; Han, Jeong Hwan; Chung, Taek-Mo; Park, Tae Joo; Kim, Seong Keun
2024-08Low temperature crystallization of atomic-layer-deposited SrTiO3 films with an extremely low equivalent oxide thickness of sub-0.4 nmChung, Hong Keun; Jeon, Jihoon; Kim, Han; Jang, Myoungsu; Kim, Sung-Chul; Won, Sung Ok; Baek, In-Hwan; Chung, Yoon Jang; Han, Jeong Hwan; Cho, Sung Haeng; Park, Tae Joo; Kim, Seong Keun
2023-07Nucleation and Layer Closure Behavior of Iridium Films Grown Using Atomic Layer DepositionChung, Hong Keun; Kim, Han; Jeon, Jihoon; Kim, Sung-Chul; Won, Sung Ok; Harada, Ryosuke; Tsugawa, Tomohiro; Chung, Yoon Jang; Baek, Seung-Hyub; Park, Tae Joo; Kim, Seong Keun
2024-02Phase-controlled molybdenum dioxide electrodes by RF reactive magnetron sputtering for achieving high-k rutile TiO2 dielectricLee, Jae Hyeon; Kang, Wangu; Chung, Hong Keun; Kim, Seong Keun; Han, Jeong Hwan
2024-07Sustained Area-Selectivity in Atomic Layer Deposition of Ir Films: Utilization of Dual Effects of O3 in Deposition and EtchingKim, Han; Kim, Taeseok; Chung, Hong Keun; Jeon, Jihoon; Kim, Sung-Chul; Won, Sung Ok; Harada, Ryosuke; Tsugawa, Tomohiro; Kim, Sangtae; Kim, Seong Keun

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