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Showing results 1 to 6 of 6

Issue Date	Title	Author(s)
2023-02	Area-Selective Atomic Layer Deposition of SnS2 Nanosheets for Applications of Back-End-of-Line-Compatible Transistors	Yim, Jaegyun; Chung, Hong Keun; Ryu, Seung Ho; Kim, Han; Won, Sung Ok; Eom, Taeyong; Chung, Taek-Mo; Kim, Seong Keun
2021-06-01	Atomic-layer deposition of TiO2 thin films with a thermally stable (CpMe5) Ti(OMe)(3) precursor	Chung, Hong Keun; Won, Sung Ok; Park, Yongjoo; Kim, Jin-Sang; Park, Tae Joo; Kim, Seong Keun
2024-04	High-Temperature Atomic Layer Deposition of Rutile TiO2 Films on RuO2 Substrates: Interfacial Reactions and Dielectric Performance	Jeon, Jihoon; Kim, Taikyu; Jang, Myoungsu; Chung, Hong Keun; Kim, Sung-Chul; Won, Sung Ok; Park, Yongjoo; Choi, Byung Joon; Chung, Yoon Jang; Kim, Seong Keun
2020-01	Investigation of phases and chemical states of tin titanate films grown by atomic layer deposition	Chung, Hong Keun; Pyeon, Jung Joon; Baek, In-Hwan; Lee, Ga-Yeon; Lee, Hansol; Won, Sung Ok; Han, Jeong Hwan; Chung, Taek-Mo; Park, Tae Joo; Kim, Seong Keun
2023-07	Nucleation and Layer Closure Behavior of Iridium Films Grown Using Atomic Layer Deposition	Chung, Hong Keun; Kim, Han; Jeon, Jihoon; Kim, Sung-Chul; Won, Sung Ok; Harada, Ryosuke; Tsugawa, Tomohiro; Chung, Yoon Jang; Baek, Seung-Hyub; Park, Tae Joo; Kim, Seong Keun
2024-02	Phase-controlled molybdenum dioxide electrodes by RF reactive magnetron sputtering for achieving high-k rutile TiO2 dielectric	Lee, Jae Hyeon; Kang, Wangu; Chung, Hong Keun; Kim, Seong Keun; Han, Jeong Hwan

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