| 1992-01 | A new chemical amplification resist system based on novolac and t-BOC protected phosphazene as a dissolution inhibitor | Ahn, K.-D.; Kang, J.-H.; Kim, S.-J.; Park, B.-S.; Park, C.-E.; Park, C.-G. |
| 1998-01 | New single-component resists based on functional polynorborneneimides by chemical amplification for deep uv lithography | Lee, C.-W.; Shin, J.-H.; Kang, J.-H.; Kim, J.-M.; Han, D.-K.; Ahn, K.-D. |
| 2000-06 | Norbornene-derived quinizarin dye molecules for photoimaging in polymer films based on chemical amplification | Ahn, K.-D.; Lee, J.-H.; Cho, I.; Park, K.H.; Kang, J.-H.; Han, D.K.; Kim, J.-M. |
| 1999-06 | Photoimaging of protected dye molecules in polymer films chemical amplification | Ahn, K.-D.; Chang, T.-E.; Chong, B.-O.; Han, D.K.; Kang, J.-H.; Kim, J.-M. |
| 2006-05 | Photoinduced functional imaging and photopatterning in polymer films based on chemical amplification by dry process | Ahn, K.-D.; Kang, J.-H. |
| 1999-12 | Synthesis of and fluorescent imaging with a polymer having t-BOC-protected quinizarin moieties | Kim, J.-M.; Chang, T.-E.; Kang, J.-H.; Han, D.K.; Ahn, K.-D. |
