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Showing results 1 to 5 of 5

Issue Date	Title	Author(s)
2014-12-20	Evaluating the Top Electrode Material for Achieving an Equivalent Oxide Thickness Smaller than 0.4 nm from an Al-Doped TiO2 Film	Jeon, Woojin; Yoo, Sijung; Kim, Hyo Kyeom; Lee, Woongkyu; An, Cheol Hyun; Chung, Min Jung; Cho, Cheol Jin; Kim, Seong Keun; Hwang, Cheol Seong
2012-01	Properties of Atomic Layer Deposited HfO2 Films on Ge Substrates Depending on Process Temperatures	Jung, Hyung-Suk; Kim, Hyo Kyeom; Yu, Il-Hyuk; Lee, Sang Young; Lee, Joohwi; Park, Jinho; Jang, Jae Hyuck; Jeon, Sang-Ho; Chung, Yoon Jang; Cho, Deok-Yong; Lee, Nae-In; Park, Tae Joo; Choi, Jung-Hae; Hwang, Cheol Seong
2012-09	Reduction of Charge Trapping in HfO2 Film on Ge Substrates by Atomic Layer Deposition of Various Passivating Interfacial Layers	Jung, Hyung-Suk; Yu, Il-Hyuk; Kim, Hyo Kyeom; Lee, Sang Young; Lee, Joohwi; Choi, Yujin; Chung, Yoon Jang; Lee, Nae-In; Park, Tae Joo; Choi, Jung-Hae; Hwang, Cheol Seong
2013-03	The Electrical Properties of Asymmetric Schottky Contact Thin-Film Transistors with Amorphous-In2Ga2ZnO7	Rha, Sang Ho; Kim, Un Ki; Jung, Jisim; Kim, Hyo Kyeom; Jung, Yoon Soo; Hwang, Eun Suk; Chung, Yoon Jang; Lee, Mijung; Choi, Jung-Hae; Hwang, Cheol Seong
2012-07	The Impact of Carbon Concentration on the Crystalline Phase and Dielectric Constant of Atomic Layer Deposited HfO2 Films on Ge Substrate	Jung, Hyung-Suk; Jeon, Sang Ho; Kim, Hyo Kyeom; Yu, Il-Hyuk; Lee, Sang Young; Lee, Joohwi; Chung, Yoon Jang; Cho, Deok-Yong; Lee, Nae-In; Park, Tae Joo; Choi, Jung-Hae; Han, Seungwu; Hwang, Cheol Seong

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