Properties of Atomic Layer Deposited HfO2 Films on Ge Substrates Depending on Process Temperatures
- Authors
- Jung, Hyung-Suk; Kim, Hyo Kyeom; Yu, Il-Hyuk; Lee, Sang Young; Lee, Joohwi; Park, Jinho; Jang, Jae Hyuck; Jeon, Sang-Ho; Chung, Yoon Jang; Cho, Deok-Yong; Lee, Nae-In; Park, Tae Joo; Choi, Jung-Hae; Hwang, Cheol Seong
- Issue Date
- 2012-01
- Publisher
- ELECTROCHEMICAL SOC INC
- Citation
- JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.159, no.4, pp.G33 - G39
- Abstract
- The effect of deposition temperature and post deposition annealing (PDA) on the electrical properties of HfO2 films grown on a Ge substrate by atomic layer deposition (ALD) was investigated. The HfO2 films deposited at 280 degrees C (280 degrees C-HfO2) showed a large capacitance-voltage (C-V) hysteresis, but it was significantly reduced at 200 degrees C (200 degrees C-HfO2). Further reduction of deposition temperature to 160 degrees C resulted in the abrupt increase of C-V hysteresis. The reduction of C-V hysteresis was originated from the smaller degree of intermixing between the HfO2 and Ge substrate with decreasing temperature, while the increase of C-V hysteresis comes from the low density of films grown at low temperatures. The C-V hysteresis characteristics were also strongly influenced by PDA temperatures. PDA temperatures higher than 550 degrees C induced a large C-V hysteresis regardless of deposition temperature. Interestingly, after the PDA process, the HfO2 grown at 200 degrees C is crystallized to the tetragonal phase, while the HfO2 grown at 280 degrees C is crystallized to the monoclinic phase. These different crystalline phases result in a lower equivalent oxide thickness in the 200 degrees C-HfO2 compared to the 280 degrees C-HfO2 (C) 2012 The Electrochemical Society. [DOI: 10.1149/2.014204jes] All rights reserved.
- Keywords
- ELECTRICAL-PROPERTIES; GATE DIELECTRICS; ZRO2; CRYSTALLIZATION; PASSIVATION; CAPACITORS; STACKS; PLASMA; ELECTRICAL-PROPERTIES; GATE DIELECTRICS; ZRO2; CRYSTALLIZATION; PASSIVATION; CAPACITORS; STACKS; PLASMA
- ISSN
- 0013-4651
- URI
- https://pubs.kist.re.kr/handle/201004/129695
- DOI
- 10.1149/2.014204jes
- Appears in Collections:
- KIST Article > 2012
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