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Issue DateTitleAuthor(s)
1997-08A study on the relation between film quality and deposition rate for amorphous silicon films grown by electron cyclotron resonance plasma chemical vapor deposition using H2/SiH4Kang, M.; Kim, J.; Lim, T.; Oh, I.; Jeon, B.; Jung, I.; An, C.
1990-01TPSR(Temperature-Programmed Surface Reaction) study of sulfur-poisoned nickel catalystHa, H.Y.; Lim, T.; Chung, J.S.; Moon, S.H.
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