| 1998-07 | Effects of Rapid Thermal Annealing on the Structural and Optical Properties of InAs/GaAs Self-Assembled Quantum Dots | Cho, S.; Hyon, C.K.; Kim, E.K.; Min, S.-K. |
| 1998-07 | Electrical properties of e-beam exposed silicon dioxides and their application to nano-devices | Choi, B.H.; Jung, S.K.; Kim, S.I.; Hwang, S.W.; Park, J.H.; Kim, Y.; Kim, E.K.; Min, S.-K. |
| 1997-12 | Formation of silicon nanocrystallites by electron cyclotron resonance chemical vapor deposition and ion beam assisted electron beam deposition | Kim, E.K.; Choi, W.Ch.; Min, S.-K.; Park, Ch.-Y. |
| 1991-01 | Highly conductive tungsten thin films prepared by the plasma-assisted silane reduction process | Kim, Y.T.; Min, S.-K.; Hong, Jong Sung; Kim, C.-K. |
| 1991-05 | Hydrogenation effect on electrical and optical properties of GaAs epilayers grown on Si substrates by metalorganic chemical vapor deposition | Kim, E.K.; Cho, H.Y.; Kim, Y.; Kim, H.S.; Kim, M.S.; Min, S.-K. |
| 2001-11 | Improved crystalline quality of GaN by substrate ion beam pre-treatment | Byun, D.; Cho, Y.S.; Kim, J.; Park, Y.J.; Kim, E.K.; Kim, G.; Koh, E.-K.; Min, S.-K. |
| 1991-01 | New insights on the effect of hydrogen to tungsten hexafluoride partial pressure ratio on plasma deposited tungsten thin films | Kim, Y.T.; Hong, J.S.; Min, S.-K. |
| 1993-02 | Properties of center and edge δ-doped GaAs-AlGaAs quantum wells grown by metalorganic chemical vapor deposition | Kim, Y.; Kim, M.-S.; Min, S.-K. |
| 1998-07 | Selectively formed InAs quantum dot arrays for device application | Hahn, C.K.; Park, Y.J.; Park, K.H.; Hyun, C.K.; Kim, E.K.; Min, S.-K.; Park, J.H. |
| 1998-07 | Self-assembled quantum dot single electron devices | Jung, S.K.; Choi, B.H.; Kim, S.I.; Hyun, C.K.; Min, B.D.; Hwang, S.W.; Park, J.H.; Kim, Y.; Kim, E.K.; Min, S.-K. |
| 1992-01 | The effect of diluent gas and rapid thermal annealing on the properties of plasma-deposited silicon nitride films | Nam, C.W.; Woo, S.I.; Kim, Y.T.; Min, S.-K. |
| 1997-12 | Visible photoluminescence from an anodized polycrystalline silicon thin film/silicon structure | Lyou, J.; Kim, E.K.; Min, S.-K.; Kang, K. |
