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Issue DateTitleAuthor(s)
1997-08A study on the relation between film quality and deposition rate for amorphous silicon films grown by electron cyclotron resonance plasma chemical vapor deposition using H2/SiH4Kang, M.; Kim, J.; Lim, T.; Oh, I.; Jeon, B.; Jung, I.; An, C.
2015-06Thermo-physical performance prediction of the KSC Ground Operation Demonstration Unit for liquid hydrogenBaik, J. H.; Oh, I.; Karng, S. W.; Notardonato, W. U.
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