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Issue DateTitleAuthor(s)
2024-04Double-gate structure enabling remote Coulomb scattering-free transport in atomic-layer-deposited IGO thin-film transistors with HfO2 gate dielectric through insertion of SiO2 interlayerChoi, Cheol Hee; Kim, Taikyu; Kim, Min Jae; Kim, Gwang-Bok; Oh, Jeong Eun; Jeong, Jae Kyeong
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