Showing results 1 to 4 of 4
Issue Date | Title | Author(s) |
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2021-06-01 | Atomic-layer deposition of TiO2 thin films with a thermally stable (CpMe5) Ti(OMe)(3) precursor | Chung, Hong Keun; Won, Sung Ok; Park, Yongjoo; Kim, Jin-Sang; Park, Tae Joo; Kim, Seong Keun |
2024-04 | High-Temperature Atomic Layer Deposition of Rutile TiO2 Films on RuO2 Substrates: Interfacial Reactions and Dielectric Performance | Jeon, Jihoon; Kim, Taikyu; Jang, Myoungsu; Chung, Hong Keun; Kim, Sung-Chul; Won, Sung Ok; Park, Yongjoo; Choi, Byung Joon; Chung, Yoon Jang; Kim, Seong Keun |
2023-09 | Silicon oxynitride thin films by plasma-enhanced atomic layer deposition using a hydrogen-free metal-organic silicon precursor and N2 plasma | Yang, Hae Lin; Kim, Tae-Yeon; Park, Gi-Beom; Yoon, Ara; Song, Ki-cheol; Lee, Yeonhee; Park, Jongryul; Kang, Taehyeong; Park, Yongjoo; Park, Jin-Seong |
2022-02-01 | Y-doped HfO2 deposited by atomic layer deposition using a cocktail precursor for DRAM capacitor dielectric application | Kim, Jenam; Kim, Byung Seok; Lee, Ae Jin; Han, Dong Hee; Hwang, Ji Hyeon; Kim, Youngjin; Song, Ki-Chang; Oh, Hansol; Kim, Sangho; Park, Yongjoo; Jeon, Woojin |