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Role of Hf in amorphous oxide thin film transistors fabricated by rf-magnetron sputtering

Other Titles

스퍼터링 공정으로 제작된 비정질 산화물 박막트랜지스터의 하프늄 금속이온 영향

Authors

Chong Eu Gene; Chun Yoon Soo; Jo Kyoungchul; Kim Seung Han; Jung Da Woon; Lee Sang Yeol

Citation

전기전자재료학회 하계학술대회, pp.12

Keywords

a-HIZO; oxide TFT; suppressor; transistor; threshold voltage

URI

https://pubs.kist.re.kr/handle/201004/100175

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KIST Conference Paper > Others

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