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dc.contributor.authorLee, Kwang Ryeol-
dc.date.accessioned2024-01-13T02:00:44Z-
dc.date.available2024-01-13T02:00:44Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/101137-
dc.languageEnglish-
dc.subjectMD simulation-
dc.subjectsurface-
dc.subjectinterface-
dc.subjectsemiconductor-
dc.titleAtomic Scale Simulation of Interface and Surface Phenomena during Thin Film Growth-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationSISPAD 2009-
dc.citation.titleSISPAD 2009-
dc.citation.conferencePlaceUS-
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