KIST Library Institutional Repository

Role of Al2O3 buffer layer in ZnO-based trransparent thin film transistors with HfO2 gate-insulator

Authors

Seongpil Chang; Song, Yong-Won; Se-Han Lee; Lee Sang Yeol; Byeong-Kwon Ju

Citation

IS-TCO 2008, pp.6

Keywords

ZnO-TFT; HfO2; Al2O3; Interfacial layer

URI

https://pubs.kist.re.kr/handle/201004/102210

Appears in Collections:

KIST Conference Paper > Others

Files in This Item:

There are no files associated with this item.

Export

RIS (EndNote)

XLS (Excel)

XML