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dc.contributor.authorKang Gil Bum-
dc.contributor.authorKim, Seong Il-
dc.contributor.authorKim, Yong Tae-
dc.contributor.authorLee Chang Woo-
dc.date.accessioned2024-01-13T06:03:16Z-
dc.date.available2024-01-13T06:03:16Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/103455-
dc.languageEnglish-
dc.subjectMetal nanodot-
dc.subjectcopolymer lithography-
dc.subjectReactive ion etching-
dc.titleFabrication of Metal Nano Dot Dry Etching Mask Using Block Copolymer Thin Film-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationNANO KOREA 2007, pp.272-
dc.citation.titleNANO KOREA 2007-
dc.citation.startPage272-
dc.citation.endPage272-
dc.citation.conferencePlaceKO-
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KIST Conference Paper > Others
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