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dc.contributor.authorKim, Seong Il-
dc.contributor.authorKang Gil Bum-
dc.contributor.authorKim, Young Hwan-
dc.contributor.authorPark, Min Chul-
dc.contributor.authorKim, Yong Tae-
dc.contributor.authorLee Chang Woo-
dc.date.accessioned2024-01-13T07:30:22Z-
dc.date.available2024-01-13T07:30:22Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/104044-
dc.languageEnglish-
dc.subjectcopolymer lithography-
dc.subjectnano dot-
dc.subjectdiblock copolymer-
dc.titleFabrication of Tungsten Nano Dots by Using Diblock Copolymer as a Mask-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationAdvanced Semiconductor Processes and Equipments 2006, pp.91 - 93-
dc.citation.titleAdvanced Semiconductor Processes and Equipments 2006-
dc.citation.startPage91-
dc.citation.endPage93-
dc.citation.conferencePlaceJA-
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