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Fabrication of Tungsten Nano Dots by Using Diblock Copolymer as a Mask

Authors

Kim, Seong Il; Kang Gil Bum; Kim, Young Hwan; Park, Min Chul; Kim, Yong Tae; Lee Chang Woo

Citation

Advanced Semiconductor Processes and Equipments 2006, pp.91 - 93

Keywords

copolymer lithography; nano dot; diblock copolymer

URI

https://pubs.kist.re.kr/handle/201004/104044

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KIST Conference Paper > Others

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