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dc.contributor.authorKu Dae Young-
dc.contributor.authorKim In-ho-
dc.contributor.author이인규-
dc.contributor.authorLEE, KYEONG SEOK-
dc.contributor.authorJONG-KEUK, PARK-
dc.contributor.authorLEE, TAEK SUNG-
dc.contributor.authorBaik, Young Joon-
dc.contributor.authorCHEONG, BYUNG KI-
dc.contributor.authorKIM, WON MOK-
dc.date.accessioned2024-01-13T08:30:41Z-
dc.date.available2024-01-13T08:30:41Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/104601-
dc.languageEnglish-
dc.subjectTransparent conducting oxide-
dc.subjectdoping-
dc.subjectsputtering-
dc.subjectthin film-
dc.subjectRF magnetron sputtering-
dc.subjectFluorine-
dc.subjectZnO-
dc.titleFluorine doping effect of ZnO film by RF magnetron sputtering-
dc.title.alternativeRF magnetron sputtering을 이용한 ZnO 박막의 F 도핑 효과-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation한국전기전자재료학회, v.5, no.2, pp.1023 - 1028-
dc.citation.title한국전기전자재료학회-
dc.citation.volume5-
dc.citation.number2-
dc.citation.startPage1023-
dc.citation.endPage1028-
dc.citation.conferencePlaceKO-
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