Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Chang Woo Lee | - |
| dc.contributor.author | Kim, Yong Tae | - |
| dc.contributor.author | Park Ji Ho | - |
| dc.contributor.author | Hee Joon Kim | - |
| dc.date.accessioned | 2024-01-13T08:33:05Z | - |
| dc.date.available | 2024-01-13T08:33:05Z | - |
| dc.date.created | 2021-09-29 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/104765 | - |
| dc.language | English | - |
| dc.subject | W-C-N | - |
| dc.subject | diffusion barrier | - |
| dc.title | Characteristics of W-C-N thin film as a new diffusion barrier for Cu interconnection | - |
| dc.type | Conference | - |
| dc.description.journalClass | 1 | - |
| dc.identifier.bibliographicCitation | 2005 Korea-Japan joint workshop on advanced semiconductor processes and equipments | - |
| dc.citation.title | 2005 Korea-Japan joint workshop on advanced semiconductor processes and equipments | - |
| dc.citation.conferencePlace | KO | - |
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