Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Chang Woo Lee | - |
| dc.contributor.author | Kim, Yong Tae | - |
| dc.date.accessioned | 2024-01-13T08:33:12Z | - |
| dc.date.available | 2024-01-13T08:33:12Z | - |
| dc.date.created | 2021-09-29 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/104772 | - |
| dc.language | English | - |
| dc.subject | pulse plasma | - |
| dc.subject | WN | - |
| dc.title | Characteristics of Cu/PPALD (pulse-plasma atomic layer deposited) WN/methyl silsequioxane/Si for multi-level Cu interconnection | - |
| dc.type | Conference | - |
| dc.description.journalClass | 1 | - |
| dc.identifier.bibliographicCitation | The international conference on electrical engineering 2005 (ICEE2005) | - |
| dc.citation.title | The international conference on electrical engineering 2005 (ICEE2005) | - |
| dc.citation.conferencePlace | CC | - |
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