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dc.contributor.authorShim, Juno-
dc.contributor.authorKwak, Soonjong-
dc.date.accessioned2024-01-13T10:33:45Z-
dc.date.available2024-01-13T10:33:45Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/105868-
dc.languageEnglish-
dc.subjectsilicon oxynitride-
dc.subjectplasma enhanced chemical vapor deposition-
dc.subjectgas barrier-
dc.subjectplastic substrate-
dc.titlePlasma-enhanced chemical vapor deposition of silicon oxynitride films and their gas barrier properties-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationPolymer Processing Society-
dc.citation.titlePolymer Processing Society-
dc.citation.conferencePlaceUS-
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