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dc.contributor.authorSun Il Shim-
dc.contributor.authorJung Ho Park-
dc.contributor.authorYoung Suk Kwon-
dc.contributor.authorKim, Seong Il-
dc.contributor.authorKim, Yong Tae-
dc.date.accessioned2024-01-13T11:01:02Z-
dc.date.available2024-01-13T11:01:02Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/105957-
dc.languageEnglish-
dc.subjectferroelectric-
dc.subjectFRAM-
dc.subjectMFISFET-
dc.subjectICP-
dc.subjectRIE-
dc.subjectetching-
dc.titleFabrication and characterization of Pt/SrBi2Ta2O9(SBT)/CeO2/Si metal ferroelectric insulator semiconductor field effect transistor (MFISFET) memory by using the inductively coupled plasma reactive ion etching (ICP RIE) process-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationAPHYS2003-11-
dc.citation.titleAPHYS2003-11-
dc.citation.conferencePlaceSP-
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