KIST Library Institutional Repository

Fabrication and characterization of Pt/SrBi2Ta2O9(SBT)/CeO2/Si metal ferroelectric insulator semiconductor field effect transistor (MFISFET) memory by using the inductively coupled plasma reactive ion etching (ICP RIE) process

Authors

Sun Il Shim; Jung Ho Park; Young Suk Kwon; Kim, Seong Il; Kim, Yong Tae

Citation

APHYS2003-11

Keywords

ferroelectric; FRAM; MFISFET; ICP; RIE; etching

URI

https://pubs.kist.re.kr/handle/201004/105957

Appears in Collections:

KIST Conference Paper > Others

Files in This Item:

There are no files associated with this item.

Export

RIS (EndNote)

XLS (Excel)

XML