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dc.contributor.authorHan, Il Ki-
dc.contributor.authorChoi, Won Jun-
dc.contributor.authorPark, Young Ju-
dc.contributor.authorCho, Woon Jo-
dc.contributor.authorLee, Jung Il-
dc.contributor.authorMyoung-Bok Lee-
dc.contributor.authorAlain Chovet-
dc.contributor.authorJean Brini-
dc.contributor.authorGerard Ghibaudo-
dc.date.accessioned2024-01-13T11:01:31Z-
dc.date.available2024-01-13T11:01:31Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/105989-
dc.languageEnglish-
dc.subjectLow frequency noise-
dc.subjectPolycrystalline-Si thin films-
dc.subjectResistors-
dc.subjectTransistors-
dc.subjectThermal activation-
dc.titlePhysical model for low frequency noise in poly-Si resistors and thin-film transistors-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitationThe First International Symposium on Future Issues in Nano-optoelectronics, pp.32 - 33-
dc.citation.titleThe First International Symposium on Future Issues in Nano-optoelectronics-
dc.citation.startPage32-
dc.citation.endPage33-
dc.citation.conferencePlaceKO-
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