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dc.contributor.author양진석-
dc.contributor.authorCho Woon Jo-
dc.contributor.author이천-
dc.contributor.authorKim Dong Woo-
dc.contributor.author신춘교-
dc.date.accessioned2024-01-13T11:34:04Z-
dc.date.available2024-01-13T11:34:04Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/106420-
dc.languageEnglish-
dc.subjectAR and HR coating-
dc.subjectrefractive index-
dc.subjectgrowth rate-
dc.subjectRF power-
dc.subjectthe ratio of Gas(Ar:O2)-
dc.titleA thin film condition of material for AR and HR coating by the DC/RF magnetron sputter-
dc.title.alternativeDC/RF magnetron sputter를 이용한 무반사 및 고반사 박막증착-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitation2003년도 한국전기전자재료학회 춘계학술대회논문집 = Proceeding of 2003 Spring Symposium of KIEE, pp.206 - 209-
dc.citation.title2003년도 한국전기전자재료학회 춘계학술대회논문집 = Proceeding of 2003 Spring Symposium of KIEE-
dc.citation.startPage206-
dc.citation.endPage209-
dc.citation.conferencePlaceKO-
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