Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 양진석 | - |
dc.contributor.author | Cho Woon Jo | - |
dc.contributor.author | 이천 | - |
dc.contributor.author | Kim Dong Woo | - |
dc.contributor.author | 신춘교 | - |
dc.date.accessioned | 2024-01-13T11:34:04Z | - |
dc.date.available | 2024-01-13T11:34:04Z | - |
dc.date.created | 2021-09-29 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/106420 | - |
dc.language | English | - |
dc.subject | AR and HR coating | - |
dc.subject | refractive index | - |
dc.subject | growth rate | - |
dc.subject | RF power | - |
dc.subject | the ratio of Gas(Ar:O2) | - |
dc.title | A thin film condition of material for AR and HR coating by the DC/RF magnetron sputter | - |
dc.title.alternative | DC/RF magnetron sputter를 이용한 무반사 및 고반사 박막증착 | - |
dc.type | Conference | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | 2003년도 한국전기전자재료학회 춘계학술대회논문집 = Proceeding of 2003 Spring Symposium of KIEE, pp.206 - 209 | - |
dc.citation.title | 2003년도 한국전기전자재료학회 춘계학술대회논문집 = Proceeding of 2003 Spring Symposium of KIEE | - |
dc.citation.startPage | 206 | - |
dc.citation.endPage | 209 | - |
dc.citation.conferencePlace | KO | - |
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