The growth and characteristics of wet thermal oxidation film for SOI fabrication

Other Titles
SOI 제작을 위한 습식 열산산화막 성장 및 특성
Authors
김형권Byun Young TaeKim Sun Ho한상국옥성해
Citation
한국광학회 제 14 회 정기총회 및 2003 년도 동계학술발표회, pp.172 - 173
Keywords
SOI; 열산화막 성장; 습식 열산화로; 식각 마스크; 포토리소그라피
URI
https://pubs.kist.re.kr/handle/201004/106477
Appears in Collections:
KIST Conference Paper > Others
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE