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Novel titanium complexes for MOCVD of titanium dioxide films with ultra-high deposition rate.

Authors

Woo Kyoungja

Citation

Book of Abstract 224th ACS National Meeting, v.Part 1 of 2, pp.# inor 638.

Keywords

design; synthesis; Ti precursor; MOCVD; deposition rate; TiO2 film

URI

https://pubs.kist.re.kr/handle/201004/106720

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KIST Conference Paper > Others

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