DSpace at KIST: Influence of the process parameters on the surface resistance of Cu/C films on polymer substrates prepared at ambient temperature by ECR-chemical vapor deposition.

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DC Field	Value	Language
dc.contributor.author	Lee Joong Kee	-
dc.contributor.author	JEON BUP JU	-
dc.contributor.author	고형덕	-
dc.contributor.author	Byun Dongjin	-
dc.contributor.author	Park Dal keun	-
dc.date.accessioned	2024-01-13T12:30:32Z	-
dc.date.available	2024-01-13T12:30:32Z	-
dc.date.created	2021-09-29	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/106723	-
dc.language	English	-
dc.subject	ECR-MOCVD	-
dc.title	Influence of the process parameters on the surface resistance of Cu/C films on polymer substrates prepared at ambient temperature by ECR-chemical vapor deposition.	-
dc.type	Conference	-
dc.description.journalClass	1	-
dc.identifier.bibliographicCitation	17th International Symposium on Chemical Reaction Engineering, pp.MS# 0150	-
dc.citation.title	17th International Symposium on Chemical Reaction Engineering	-
dc.citation.startPage	MS# 0150	-
dc.citation.endPage	MS# 0150	-
dc.citation.conferencePlace	HK	-

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