Full metadata record
| DC Field | Value | Language | 
|---|---|---|
| dc.contributor.author | Lee Joong Kee | - | 
| dc.contributor.author | JEON BUP JU | - | 
| dc.contributor.author | 고형덕 | - | 
| dc.contributor.author | Byun Dongjin | - | 
| dc.contributor.author | Park Dal keun | - | 
| dc.date.accessioned | 2024-01-13T12:30:32Z | - | 
| dc.date.available | 2024-01-13T12:30:32Z | - | 
| dc.date.created | 2021-09-29 | - | 
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/106723 | - | 
| dc.language | English | - | 
| dc.subject | ECR-MOCVD | - | 
| dc.title | Influence of the process parameters on the surface resistance of Cu/C films on polymer substrates prepared at ambient temperature by ECR-chemical vapor deposition. | - | 
| dc.type | Conference | - | 
| dc.description.journalClass | 1 | - | 
| dc.identifier.bibliographicCitation | 17th International Symposium on Chemical Reaction Engineering, pp.MS# 0150 | - | 
| dc.citation.title | 17th International Symposium on Chemical Reaction Engineering | - | 
| dc.citation.startPage | MS# 0150 | - | 
| dc.citation.endPage | MS# 0150 | - | 
| dc.citation.conferencePlace | HK | - | 
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.