DSpace at KISTKIST Conference PaperOthers

Full metadata record

DC Field Value Language
dc.contributor.author차국헌-
dc.contributor.author주상현-
dc.contributor.author김수한-
dc.contributor.author심현상-
dc.contributor.authorKim Yong Tae-
dc.contributor.author한진희-
dc.contributor.author이진규-
dc.contributor.author윤도영-
dc.date.accessioned2024-01-13T14:02:10Z-
dc.date.available2024-01-13T14:02:10Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/107632-
dc.languageEnglish-
dc.subjectlow-k-
dc.subjectMSQ-
dc.subjectinterconnection-
dc.titleStructural and micromechanical characteristics of low-dielectric organosilicate thin films modified by NH₃ plasma treatment-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitationThe Second Asian Conference on Chemical Vapor Deposition, pp.48 - 51-
dc.citation.titleThe Second Asian Conference on Chemical Vapor Deposition-
dc.citation.startPage48-
dc.citation.endPage51-
dc.citation.conferencePlaceKO-
Appears in Collections:
KIST Conference Paper > Others
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML
Show Simple Item Record

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE