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dc.contributor.authorKWON YOUNG AH-
dc.contributor.author채경수-
dc.contributor.authorJongyong Kim-
dc.contributor.author정대석-
dc.contributor.authorPark Jong Oh-
dc.contributor.authorOH MYUNG HWAN-
dc.contributor.authorMoon Sung Wook-
dc.date.accessioned2024-01-13T14:34:17Z-
dc.date.available2024-01-13T14:34:17Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/108029-
dc.languageEnglish-
dc.subjectPMER-
dc.subjectUV-LIGA-
dc.subjectnegative photoresist-
dc.titleNegative PMER as a novel mold material for UV-LIGA process-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitationProceedings of the International Sensor Conference 2001, pp.217 - 218-
dc.citation.titleProceedings of the International Sensor Conference 2001-
dc.citation.startPage217-
dc.citation.endPage218-
dc.citation.conferencePlaceKO-
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