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dc.contributor.authorPARK YOUNG JOON-
dc.contributor.authorVaibhav K. Andleigh-
dc.contributor.authorCarl V. Thompson-
dc.contributor.author최인석-
dc.contributor.author주영창-
dc.date.accessioned2024-01-13T15:04:10Z-
dc.date.available2024-01-13T15:04:10Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/108259-
dc.languageEnglish-
dc.subjectelectromigration-
dc.subjectcomputer simulation-
dc.titleULSI interconnect failures due to electromigration-induced stress evolution: computer simulation study-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationProc. of the 6th Workshop on Atomic-migration and Stress-induced Phenomena in ULSI Metallizations, pp.19 - 22-
dc.citation.titleProc. of the 6th Workshop on Atomic-migration and Stress-induced Phenomena in ULSI Metallizations-
dc.citation.startPage19-
dc.citation.endPage22-
dc.citation.conferencePlaceJA-
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