Plasma source ion implantations for shallow junction

Authors
조정희HAN SEUNG HEELEE YEON HEE김옥경김곤호황현상김영우LIM HYUN EUIJUNG, HYE SUN백성권
Citation
제19회 한국진공학회 학술발표회, pp.49
Keywords
shallow junction; PSII; rapid thermal annealer
URI
https://pubs.kist.re.kr/handle/201004/108278
Appears in Collections:
KIST Conference Paper > Others
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