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dc.contributor.author조정희-
dc.contributor.authorHAN SEUNG HEE-
dc.contributor.authorLEE YEON HEE-
dc.contributor.author김옥경-
dc.contributor.author김곤호-
dc.contributor.author김영우-
dc.contributor.authorLIM HYUN EUI-
dc.contributor.authorSUH MOO JIN-
dc.date.accessioned2024-01-13T16:01:01Z-
dc.date.available2024-01-13T16:01:01Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/108621-
dc.languageEnglish-
dc.subjectplasma source ion implantation-
dc.subjectshallow p+/n junction-
dc.subjectelectrical characteristics-
dc.titlePlasma source ion implantations for shallow p+/n junction-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation제18회 한국진공학회 학술발표회, pp.180-
dc.citation.title제18회 한국진공학회 학술발표회-
dc.citation.startPage180-
dc.citation.endPage180-
dc.citation.conferencePlaceKO-
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