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dc.contributor.author경제홍-
dc.contributor.authorCHO SEONG HOON-
dc.contributor.authorHAN SUNG HAN-
dc.contributor.author최승철-
dc.date.accessioned2024-01-13T17:04:36Z-
dc.date.available2024-01-13T17:04:36Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/109377-
dc.languageEnglish-
dc.subjectAlN-
dc.subjectMOCVD-
dc.subjectsingle precursor-
dc.titleAluminum nitride thin film deposition using noble single precursor by MOCVD-
dc.title.alternative유기금속화합물을 이용한 질화알루미늄(AlN) 박막 제조-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation1999년도 춘계총회, 초청·특별강연, 연구발표회, pp.102-
dc.citation.title1999년도 춘계총회, 초청·특별강연, 연구발표회-
dc.citation.startPage102-
dc.citation.endPage102-
dc.citation.conferencePlaceKO-
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