DSpace at KISTKIST Conference PaperOthers

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dc.contributor.author이석형-
dc.contributor.author김동준-
dc.contributor.author양성훈-
dc.contributor.author박정원-
dc.contributor.author손세일-
dc.contributor.author오경희-
dc.contributor.authorKim Yong Tae-
dc.contributor.author박종완-
dc.date.accessioned2024-01-13T18:34:25Z-
dc.date.available2024-01-13T18:34:25Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/110172-
dc.languageEnglish-
dc.subjectLow-K-
dc.titleReliability of Cu/W-N thin films deposited on low dielectric constant SiO:F ILD-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationMRS 98', pp.?-
dc.citation.titleMRS 98'-
dc.citation.startPage?-
dc.citation.endPage?-
dc.citation.conferencePlaceUS-
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