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The characteristics of a-Si:H films as a function of H2/SiH4 ratio in EVR CVD

Authors

강문상; JEON BUP JU; Lim Tae Hoon; Oh In Hwan

Citation

IEEE international conference on microelectronics, Cario, Egypt.

URI

https://pubs.kist.re.kr/handle/201004/111575

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KIST Conference Paper > Others

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