DSpace at KIST: Preparation of silicon oxide films using electron cyclotron resonance oxygen plasma

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DC Field	Value	Language
dc.contributor.author	허정수	-
dc.contributor.author	JEON BUP JU	-
dc.contributor.author	윤용수	-
dc.contributor.author	정일현	-
dc.contributor.author	Oh In Hwan	-
dc.contributor.author	Lim Tae Hoon	-
dc.date.accessioned	2024-01-13T21:32:40Z	-
dc.date.available	2024-01-13T21:32:40Z	-
dc.date.created	2021-09-29	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/111662	-
dc.language	English	-
dc.title	Preparation of silicon oxide films using electron cyclotron resonance oxygen plasma	-
dc.title.alternative	ECR 산소 플라즈마를 이용한 실리콘 산화막의 제조	-
dc.type	Conference	-
dc.description.journalClass	2	-
dc.identifier.bibliographicCitation	Theories and applications of chem. res., v.2, no.1, pp.1001 - ?	-
dc.citation.title	Theories and applications of chem. res.	-
dc.citation.volume	2	-
dc.citation.number	1	-
dc.citation.startPage	1001	-
dc.citation.endPage	?	-
dc.citation.conferencePlace	KO	-

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