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dc.contributor.authorKim Yong Tae-
dc.contributor.authorH. S. Yoon-
dc.contributor.authorC. S. Kwon-
dc.contributor.authorH. N. Lee-
dc.contributor.authorJ. Jang-
dc.contributor.authorMin Suk-Ki-
dc.date.accessioned2024-01-13T22:04:00Z-
dc.date.available2024-01-13T22:04:00Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/112000-
dc.languageEnglish-
dc.titleCharacteristics of RuOx thin films as a sacrificial diffusion barrier for Cu metallization-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation한국물리학회 제71회 학술논문발표회-
dc.citation.title한국물리학회 제71회 학술논문발표회-
dc.citation.conferencePlaceKO-
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