Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Bae Gwi-Nam | - |
dc.contributor.author | 안강호 | - |
dc.date.accessioned | 2024-01-13T22:04:18Z | - |
dc.date.available | 2024-01-13T22:04:18Z | - |
dc.date.created | 2021-09-29 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/112017 | - |
dc.language | English | - |
dc.subject | particle deposition | - |
dc.subject | 입자침착 | - |
dc.subject | 회전웨이퍼 | - |
dc.subject | 입자침착속도 | - |
dc.subject | 회전속도 | - |
dc.title | A study on the particle deposition toward a rotating wafer surface. | - |
dc.title.alternative | 회전 웨이퍼상의 입자침착에 관한 연구 = | - |
dc.type | Conference | - |
dc.description.journalClass | 2 | - |
dc.identifier.bibliographicCitation | 대한기계학회 1995 년도 추계학술대회논문집 (II)., pp.350 - 354 | - |
dc.citation.title | 대한기계학회 1995 년도 추계학술대회논문집 (II). | - |
dc.citation.startPage | 350 | - |
dc.citation.endPage | 354 | - |
dc.citation.conferencePlace | KO | - |
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