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dc.contributor.authorBae Gwi-Nam-
dc.contributor.author안강호-
dc.date.accessioned2024-01-13T22:04:18Z-
dc.date.available2024-01-13T22:04:18Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/112017-
dc.languageEnglish-
dc.subjectparticle deposition-
dc.subject입자침착-
dc.subject회전웨이퍼-
dc.subject입자침착속도-
dc.subject회전속도-
dc.titleA study on the particle deposition toward a rotating wafer surface.-
dc.title.alternative회전 웨이퍼상의 입자침착에 관한 연구 =-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation대한기계학회 1995 년도 추계학술대회논문집 (II)., pp.350 - 354-
dc.citation.title대한기계학회 1995 년도 추계학술대회논문집 (II).-
dc.citation.startPage350-
dc.citation.endPage354-
dc.citation.conferencePlaceKO-
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